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Recent successes at Process Evolution |
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AMR provides better resolution with fewer total surface triangles than would result from using a higher grid density.
The AMR used was developed in-house, is "unstructured", and is based upon local mean curvature.
Example: Simulated deposition of a few nm of material on a ~150 nm pyramid, for 2 levels of refinement ("0 and 1")
| The 2 figures to the right show nanopyramids before and after deposition using AMR (for level set extractions and evolution) to help resolve the edges of the pyramid. |
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Example: Same process as above, using extractions with the same base resolution, but w/o AMR
| The 2 figures to the right show nanopyramids before and after depostion NOT using AMR. Note the rough edges that can cause modeling trouble. (Though the edges can be smoothed and/or using "dummy process/deposition steps".) |
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Example: Extractions of the input nanopyramid with 2 different sets of parameters, using 4 levels of refinement (0-3)
| The 2 figures to the right show nanopyramids "extracted" (using different parameters) in our new AMR technique. Both have 4 levels of refinement. In the near one, the rough edges help hi-lite the refinement. in the far one, different parameters were used to extract, and a little smoothing was done. |
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FEM Meshes
Nanostructure processing using EVOLVE 3D and finite element modeling using ELMER
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